| 摘要 |
Provided are: a cleaning composition for inhibiting metal corrosion for copper (Cu), tungsten (W), titanium (Ti), tantalum (Ta), cobalt (Co), and aluminum (Al); a method; and a system. The cleaning composition for inhibiting metal corrosion provides an effect of inhibiting corrosion by using a combination of two chemicals which are at least one multi-functional amine having greater than one amino group, and at least one multi-functional acid having greater than one carboxylate group. The cleaning composition for inhibiting metal corrosion is effective in cleaning: residues derived from ashing plasma containing oxygen after etching high density plasma; and slurry particles and residues remaining after chemical mechanical polishing (CMP). |
