| 摘要 |
The present invention relates to a manufacturing method of a separable pattern layer and, specifically, to a manufacturing method of a separable pattern layer, which comprises: applying a resin layer on an upper surface of a first substrate; manufacturing a pattern layer by radiating ultraviolet (UV) rays and curing the resin layer formed with a pattern after forming the pattern by pressurizing a mold; and attaching the pattern layer on a second substrate desired by a user by using a separation fragment and easily separating the pattern layer from the first substrate. |
