发明名称 |
CURED PRODUCT OF PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION USED THEREFOR, METHOD FOR MANUFACTURING SUBSTRATE FOR MOUNTING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a cured product of a photosensitive resin composition, with which a shape of a fillet formed by using an underfill material can be controlled and a favorable fillet shape can be formed, and a method for manufacturing a substrate for mounting a semiconductor device and a method for manufacturing a semiconductor device using the above composition.SOLUTION: The cured product of a photosensitive resin composition is obtained by forming a photosensitive resin composition layer by using a photosensitive resin composition on a substrate, irradiating the photosensitive resin composition layer with active rays to cure, and subjecting the cured product to a surface treatment to obtain a surface roughness (arithmetic average roughness Ra) of 0.15 to 0.5 μm in a measurement range of 1 to 10 mm. The surface treatment is preferably a plasma treatment. |
申请公布号 |
JP2016012002(A) |
申请公布日期 |
2016.01.21 |
申请号 |
JP20140132595 |
申请日期 |
2014.06.27 |
申请人 |
HITACHI CHEMICAL CO LTD |
发明人 |
FUKUZUMI SHIZU;TAKEKOSHI MASAAKI;KURABUCHI KAZUHIKO;KOMURO NOBUHITO;YOSHINO TOSHISUMI |
分类号 |
G03F7/004;G03F7/027;H05K3/28 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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