发明名称 CURED PRODUCT OF PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION USED THEREFOR, METHOD FOR MANUFACTURING SUBSTRATE FOR MOUNTING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a cured product of a photosensitive resin composition, with which a shape of a fillet formed by using an underfill material can be controlled and a favorable fillet shape can be formed, and a method for manufacturing a substrate for mounting a semiconductor device and a method for manufacturing a semiconductor device using the above composition.SOLUTION: The cured product of a photosensitive resin composition is obtained by forming a photosensitive resin composition layer by using a photosensitive resin composition on a substrate, irradiating the photosensitive resin composition layer with active rays to cure, and subjecting the cured product to a surface treatment to obtain a surface roughness (arithmetic average roughness Ra) of 0.15 to 0.5 μm in a measurement range of 1 to 10 mm. The surface treatment is preferably a plasma treatment.
申请公布号 JP2016012002(A) 申请公布日期 2016.01.21
申请号 JP20140132595 申请日期 2014.06.27
申请人 HITACHI CHEMICAL CO LTD 发明人 FUKUZUMI SHIZU;TAKEKOSHI MASAAKI;KURABUCHI KAZUHIKO;KOMURO NOBUHITO;YOSHINO TOSHISUMI
分类号 G03F7/004;G03F7/027;H05K3/28 主分类号 G03F7/004
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