发明名称 INTRINSIC VERTICAL BIT LINE ARCHITECTURE
摘要 Methods for reducing leakage currents through unselected memory cells of a memory array during a memory operation are described. In some cases, the leakage currents through the unselected memory cells of the memory array may be reduced by setting an adjustable resistance bit line structure connected to the unselected memory cells into a non-conducting state. The adjustable resistance bit line structure may comprise a bit line structure in which the resistance of an intrinsic (or near intrinsic) polysilicon portion of the bit line structure may be adjusted via an application of a voltage to a select gate portion of the bit line structure that is not directly connected to the intrinsic polysilicon portion. The intrinsic polysilicon portion may be set into a conducting state or a non-conducting state based on the voltage applied to the select gate portion.
申请公布号 US2016019952(A1) 申请公布日期 2016.01.21
申请号 US201514715562 申请日期 2015.05.18
申请人 SANDISK 3D LLC 发明人 Ratnam Perumal
分类号 G11C13/00 主分类号 G11C13/00
代理机构 代理人
主权项 1. A non-volatile storage system, comprising: a first word line; an adjustable resistance bit line structure, the adjustable resistance bit line structure includes an adjustable resistance local bit line and a select gate; and a first memory element arranged between the first word line and the adjustable resistance local bit line, the adjustable resistance bit line structure configured to set a resistance of the adjustable resistance local bit line based on a first voltage applied to the select gate.
地址 Milpitas CA US