发明名称 METHOD FOR FORMING A THIN-FILM LAYER PATTERN, DISPLAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE
摘要 A method for forming a thin-film layer pattern, a display substrate and a manufacturing method thereof, and a display device are provided. The method for forming the thin-film layer pattern comprises: forming a first thin-film layer to be patterned on a substrate; forming a first overcoat (OC) layer on a surface of the first thin-film layer; forming a first overcoat layer pattern by beam melting; and removing the first thin-film layer not covered by the first overcoat layer pattern to form a first thin-film layer pattern. The method adopts beam melting process and hence can improve the accuracy and the resolution of the display substrate, improve the product quality and reduce the manufacturing cost.
申请公布号 US2016020231(A1) 申请公布日期 2016.01.21
申请号 US201414429640 申请日期 2014.06.27
申请人 BOE TECHNOLOGY GROUP CO., LTD. ;BEIJING BOE DISPLAY TECHNOLOGY CO., LTD. 发明人 XU Liyan;TIAN Ming;WANG Junwei
分类号 H01L27/12 主分类号 H01L27/12
代理机构 代理人
主权项 1. A method for manufacturing a thin-film layer pattern, comprising: forming a first thin-film layer to be patterned on a substrate; forming a first overcoat layer on a surface of the first thin-film layer; forming a first overcoat layer pattern by beam melting; and removing the first thin-film layer not covered by the first overcoat layer pattern to form a first thin-film layer pattern.
地址 Beijing CN
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