| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning that achieves stable continuation of both a cleaning speed and a discharge, protects the power source,and also prevents damage to a member in a device.SOLUTION: There is provided a method for cleaning a deposition film formation device in which the inside of a reaction container is cleaned after a deposition film is formed, the method including a first cleaning process, a cleaning condition change process, and a second cleaning process in this order. In the first cleaning process, a value of a voltage and a value of a current are measured, the cleaning condition change process is a process of changing cleaning conditions on the basis of conductance calculated from the values measured in the first cleaning process, and the second cleaning process is a process of cleaning under cleaning conditions having been changed in the cleaning condition change process, the voltage having only the negative polarity in the first cleaning process and both the polarities in the second cleaning process. |
