发明名称 MULTIFUNCTIONAL ANODIZED LAYER
摘要 A method of anodizing includes immersing an aluminum alloy workpiece in a phosphoric acid anodizing solution and applying a voltage to form a porous oxide layer on the workpiece. The workpiece is then removed from the phosphoric acid anodizing solution and immersed in a controlled anodizing solution. A voltage is applied to form a dense oxide layer under the porous oxide layer. Dissolution of the porous oxide layer is controlled during the formation of the dense oxide layer by using tartaric acid in the controlled acid solution such that the thickness of the porous oxide layer is substantially equivalent before and after the formation of the dense oxide layer. The duplex anodized layer can be further sealed by soaking in a sealing solution to protect the porous oxide layer from hydrolytic decomposition, to improve corrosion protection, and to enhance the bonding with other structural components through adhesives.
申请公布号 US2016017510(A1) 申请公布日期 2016.01.21
申请号 US201514792913 申请日期 2015.07.07
申请人 United Technologies Corporation 发明人 Jaworowski Mark R.;Tang Xia;Ding Zhongfen
分类号 C25D11/12;C25D11/24 主分类号 C25D11/12
代理机构 代理人
主权项 1. A method of anodizing comprising: immersing an aluminum alloy workpiece in a phosphoric acid anodizing solution; applying a voltage to the aluminum alloy workpiece in the phosphoric acid anodizing solution, the phosphoric acid anodizing solution and the voltage acting to form a porous oxide layer on the aluminum alloy workpiece; removing the aluminum alloy workpiece from the phosphoric acid anodizing solution and then immersing the aluminum alloy workpiece in a controlled anodizing solution; applying a voltage to the aluminum alloy workpiece in the controlled anodizing solution, the controlled anodizing solution and the voltage acting to form a dense oxide layer on the aluminum alloy workpiece under the porous oxide layer; and controlling dissolution of the porous oxide layer during the formation of the dense oxide layer by using tartaric acid in the controlled acid solution such that the thickness of the porous oxide layer is substantially equivalent before and after the formation of the dense oxide layer.
地址 Hartford CT US
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