发明名称 |
VACUUM ULTRAVIOLET LIGHT SOURCE DEVICE, LIGHT IRRADIATION DEVICE AND METHOD FOR PATTERNING SELF-ASSEMBLED MONOMOLECULAR FILM |
摘要 |
To suppress the amount of ozone generation when vacuum ultraviolet light (VUV light) is irradiated in an atmosphere containing oxygen. A light irradiation device (100) irradiates a self-assembled monomolecular film (SAM film), which is formed on a work (W), with light containing VUV light through a mask (M) of a predetermined pattern in an atmosphere containing oxygen, thereby patterning the SAM film. The light containing VUV light irradiated on the SAM film is pulsed light and has a light emission duty ratio of from 0.00001 to 0.01 (inclusive). |
申请公布号 |
WO2016009624(A1) |
申请公布日期 |
2016.01.21 |
申请号 |
WO2015JP03467 |
申请日期 |
2015.07.09 |
申请人 |
USHIO DENKI KABUSHIKI KAISHA |
发明人 |
OWADA, TATSUSHI;SUZUKI, SHINJI |
分类号 |
H01J61/90;B01J19/12;H01L21/027 |
主分类号 |
H01J61/90 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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