ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, PHOTOMASK AND PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE

摘要

There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) containing a repeating unit represented by a specific formula (1), and an ionic compound (B) represented by a specific formula (2), a resist film formed by using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method including: (a) a step of forming the resist film, (b) a step of exposing the film, and (c) a step of developing the exposed film using a developer to form a pattern.

主权项

1. An actinic ray-sensitive or radiation-sensitive resin composition containing:
a resin (A) containing a repeating unit represented by formula (1) shown below, and an ionic compound (B) represented by formula (2) shown below: wherein in formula (1) above, X1 represents a single bond or a divalent connecting group, A1 represents a keto group or an (n1+1) valent aromatic ring group, each of R11, R12 and R13 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, R13 may be connected to A1 to form a ring and in this case R13 represents an alkylene group, Ra represents an alkyl group having 2 or more carbon atoms, a cycloalkyl group, an aryl group, an aralkyl group or a heterocyclic group, Rb represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or a heterocyclic group, M represents a single bond or a divalent connecting group, Q represents an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or a heterocyclic group, Ra and Rb may be connected to form a ring, at least two of Ra, M and Q may be connected to form a ring, when A1 is a keto group, n1 represents 1, and when A1 is an (n+1) valent aromatic ring group, n1 represents an integer from 1 to 4, when n1 is 2 or more, each of a plurality of Ra, each of a plurality of Rb, each of a plurality of M and each of a plurality of Q may be the same as or different from every other Ra, Rb, M and Q, respectively, in formula (2) above, A− represents an organic acid anion, L represents a single bond or a divalent connecting group, cation X+ represents a nitrogen cation or a sulfur cation, each Rx independently represents an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or a heterocyclic group, a plurality of Rx may be connected to each other to from a ring, and the ring formed may contain a nitrogen atom, an oxygen atom or a sulfur atom, as a ring member, n2 represents 3, when X+ is a nitrogen cation, and n2 represents 2, when X+ is a sulfur cation.