| 发明名称 |
HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION |
| 摘要 |
A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent.;;In the Chemical Formula 1,
A, B, R1 and R2 are the same as defined in the detailed description. |
| 申请公布号 |
US2016017174(A1) |
申请公布日期 |
2016.01.21 |
| 申请号 |
US201514748911 |
申请日期 |
2015.06.24 |
| 申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
NAM Youn-Hee;KIM Hea-Jung;SONG Hyun-Ji |
| 分类号 |
C09D165/02;H01L21/311;H01L21/027;H01L21/02 |
主分类号 |
C09D165/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A hardmask composition, comprising:
a polymer including a moiety represented by the following Chemical Formula 1; and a solvent, wherein, in the Chemical Formula 1, A and B are independently substituted or unsubstituted aromatic ring group, and R1 and R2 are independently fluorine, a hydroxy group, a substituted or unsubstituted aromatic ring group, or a combination thereof. |
| 地址 |
Yongin-si KR |
