发明名称 UNIT CELLS OF NONVOLATILE MEMORY DEVICES, CELL ARRAYS OF NONVOLATILE MEMORY DEVICES, AND METHODS OF FABRICATING THE SAME
摘要 Unit cells including a substrate having an active region, a first charge trap pattern disposed on the substrate to intersect the active region, a second charge trap pattern disposed on the substrate to intersect the active region and spaced apart from the first charge trap pattern, a first junction region disposed in the active region between the first and second charge trap patterns, a second junction region disposed in the active region adjacent to one side of the first charge trap pattern opposite to the second charge trap pattern, and a third junction region disposed in the active region adjacent to one side of the second charge trap pattern opposite to the first charge trap pattern.
申请公布号 US2016020292(A1) 申请公布日期 2016.01.21
申请号 US201414498582 申请日期 2014.09.26
申请人 SK hynix Inc. 发明人 KWON Young Joon
分类号 H01L29/423;H01L27/115;H01L29/792 主分类号 H01L29/423
代理机构 代理人
主权项 1. A unit cell of a nonvolatile memory device, the unit cell comprising: a substrate having an active region; a first charge trap pattern disposed on the substrate to intersect the active region; a second charge trap pattern disposed on the substrate to intersect the active region and spaced apart from the first charge trap pattern; a first junction region disposed in the active region between the first and second charge trap patterns; a second junction region disposed in the active region adjacent to one side of the first charge trap pattern opposite to the second charge trap pattern and spaced apart from the first junction region by a first planar channel region; and a third junction region disposed in the active region adjacent to one side of the second charge trap pattern opposite to the first charge trap pattern and spaced apart from the first junction region by a second planar channel region.
地址 Gyeonggi-do KR