| 摘要 |
Provided are an inspection device and a method of controlling same, which implement high sensitivity inspection according to the inspection speed (inspection rate). In particular, provided are an inspection device and a method of controlling same, which are suitable for inspection in which a complex and fine sized pattern/defect serves as the target for inspection when a low inspection speed is set. This semiconductor inspection device, which performs inspection by using a plurality of detectors to receive scattered light generated by emitting light onto a wafer to be inspected, is provided with: a signal calculating unit for calculating detector control signals for controlling operation of the detectors; a signal generating unit for generating control signals for the detectors on the basis of the calculated signals; and a control unit for controlling the semiconductor inspection device, and outputting inspection speed signals pertaining to the inspection speed. The signal calculating unit calculates the detector control signals on the basis of the inspection speed signals output from the control unit, and the signal generating unit generates control signals of first and second detectors respectively synchronized in the first and second detectors. |
