| 摘要 |
An array substrate and a manufacturing method therefor. The manufacturing method comprises: a substrate (21) is provided; a plurality of pixel structures are formed on a display area. A manufacturing method for at least one pixel structure comprises: a patterned first metal layer (22), a gate insulating layer (23) and a patterned second metal layer (24) are sequentially formed on the substrate (21). The patterned first metal layer (22) comprises a gate line (221) and a floating metal pattern (222) arranged so as to be insulated from the gate line (221), and the patterned second metal layer (24) comprises a data line (241), a source (242) and a drain (243), the data line (241) being arranged so as to correspond to the floating metal pattern (222) via the gate insulating layer (23). The array substrate increases the capacitance for storing static electricity produced by bombardment of the second metal layer (24) by a dry etching plasma, and prevents electrostatic breakdown caused by insufficient capacitance storage capability. |
