GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE AND PRODUCTION METHOD THEREFOR

摘要

The Group III nitride semiconductor light-emitting device has an insulating multilayer film intervening between a second semiconductor layer and a transparent electrode. The insulating multilayer film serves as a distributed Bragg reflector and is formed in a region including a projection area obtained by projecting a p-electrode to the p-type contact layer. The insulating multilayer film has a first region and a second region, wherein the first region has a layer thickness greater than 95% of the maximum film thickness of the insulating multilayer film, and the second region has a layer thickness not greater than 95% of the maximum film thickness of the insulating multilayer film. The second surface of the insulating multilayer film in the second region has a slope having a dent portion denting toward the first surface of the insulating film.

主权项

1. A Group III nitride semiconductor light-emitting device comprising:
a first semiconductor layer having a first conduction type; a light-emitting layer disposed on the first semiconductor layer; a second semiconductor layer having a second conduction type, the layer being disposed on the light-emitting layer; a transparent electrode disposed on the second semiconductor layer; a first electrode electrically connected to the first semiconductor layer; and a second electrode electrically connected to the second semiconductor layer; wherein the Group III nitride semiconductor light-emitting device comprises an insulating multilayer film which intervenes between the second semiconductor layer and the transparent electrode, the insulating multilayer film comprising a first surface in contact with the second semiconductor layer and a second surface in contact with the transparent electrode; the insulating multilayer film serves as a distributed Bragg reflector and is formed in a region including a projection area obtained by projecting the second electrode to the second semiconductor layer; the insulating multilayer film comprises a first region and a second region, wherein the first region comprises a layer thickness greater than 95% of the maximum film thickness of the insulating multilayer film, and the second region comprises a layer thickness not greater than 95% of the maximum film thickness of the insulating multilayer film; and the second surface of the insulating multilayer film in the second region comprises a slope having a dent portion denting toward the first surface.