发明名称 FIXING APPARATUS
摘要 A fixing apparatus includes a cylindrical film, a heater including a substrate, a first heat generation resistor formed on a first surface of the substrate which is a surface facing an inner surface of the film, and a second heat generation resistor formed on a second surface opposite to the first surface, and a control portion, wherein during a time period from the start of warm-up of the fixing apparatus to a predetermined time, the control portion is configured either to supply power to the first heat generation resistor while supplying no power to the second heat generation resistor or to supply power to the first heat generation resistor and the second heat generation resistor such that the power supplied to the first heat generation resistor is higher than the power supplied to the second heat generation resistor.
申请公布号 US2016018764(A1) 申请公布日期 2016.01.21
申请号 US201514800506 申请日期 2015.07.15
申请人 CANON KABUSHIKI KAISHA 发明人 Takagi Kenji;Sako Masato
分类号 G03G15/20 主分类号 G03G15/20
代理机构 代理人
主权项 1. A fixing apparatus configured to fix a toner image to a recording material, the fixing apparatus comprising: a cylindrical film; a heater arranged to contact an inner surface of the film, the heater including a substrate, a first heat generation resistor formed on a first surface of the substrate which is a surface facing the inner surface of the film, and a second heat generation resistor formed on a second surface of the substrate which is a surface opposite to the first surface; a back-up member contacting the film to form a pressure contact portion; and a control portion configured to control the power supply to the heater so as to supply power to the first heat generation resistor and to the second heat generation resistor independently, wherein a recording material is heated by heat of the film to fix the toner image to the recording material, and wherein during a time period from the start of warm-up of the fixing apparatus to a predetermined time, the control portion is configured either to supply power to the first heat generation resistor while supplying no power to the second heat generation resistor or to supply power to the first heat generation resistor and the second heat generation resistor such that the power supplied to the first heat generation resistor is higher than the power supplied to the second heat generation resistor.
地址 Tokyo JP