| 发明名称 |
COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS |
| 摘要 |
The invention provides a compound for forming an organic film having a partial structure represented by the following formula (vii-2),;;wherein R1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R1 may be substituted by an oxygen atom; a+b is 1, 2 or 3; c and d are each independently 0, 1 or 2; x represents 0 or 1, when x=0, then a=c=0; L7 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L8′ represents the partial structure represented by the following formula (i), 0≦o<1, 0<p≦1 and o+p=1,;;wherein the ring structures Ar3 represent a substituted or unsubstituted benzene ring or naphthalene ring; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; and L0 represents a divalent organic group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics. |
| 申请公布号 |
US2016018735(A1) |
申请公布日期 |
2016.01.21 |
| 申请号 |
US201514856094 |
申请日期 |
2015.09.16 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
TACHIBANA Seiichiro;KORI Daisuke;OGIHARA Tsutomu;WATANABE Takeru;NODA Kazumi;YANO Toshiharu |
| 分类号 |
G03F7/11;G03F7/32;G03F7/40;H01L21/027;C09D129/02;C08F216/10;C09D165/00;G03F7/20;C08G61/12 |
主分类号 |
G03F7/11 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A compound for forming an organic film, wherein the compound contains a polymer having a partial structure represented by the following formula (vii-2), wherein R1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R1 may be substituted by an oxygen atom; a+b is 1, 2 or 3; c and d are each independently 0, 1 or 2; x represents 0 or 1, when x=0, then a=c=0; L7 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L8′ represents the partial structure represented by the following formula (i), 0≦o<1, 0<p≦1 and o+p=1, wherein the ring structures Ar3 represent a substituted or unsubstituted benzene ring or naphthalene ring; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; and L0 represents a divalent organic group selected from the following: |
| 地址 |
Tokyo JP |
