| 发明名称 |
SEMICONDUCTOR DEVICE |
| 摘要 |
A semiconductor device for use in an optical application and a method for fabricating the device. The device includes: an optically passive aspect that is operable in a substantially optically passive mode; and an optically active material having a material that is operable in a substantially optically active mode, wherein the optically passive aspect is patterned to include a photonic structure with a predefined structure, and the optically active material is formed in the predefined structure so as to be substantially self-aligned in a lateral plane with the optically passive aspect. |
| 申请公布号 |
US2016018596(A1) |
申请公布日期 |
2016.01.21 |
| 申请号 |
US201514867184 |
申请日期 |
2015.09.28 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
Czornomaz Lukas;Hofrichter Jens;Richter Mirja;Riel Heike |
| 分类号 |
G02B6/122;H01L31/18;G02B6/42;G02B6/136;G02B6/124;H01L33/00;H01S5/183 |
主分类号 |
G02B6/122 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for fabricating a semiconductor device for use in an optical application, the method comprising:
providing an optically passive aspect that is operable in a substantially optically passive mode; providing an optically active material having a material that is operable in a substantially optically active mode; wherein the optically passive aspect is patterned to include a photonic structure with a predefined structure; and wherein the optically active material is formed in the predefined structure so as to be substantially self-aligned in a lateral plane with the optically passive aspect. |
| 地址 |
ARMONK NY US |
