| 发明名称 |
MOLD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD |
| 摘要 |
A mold includes a plurality of pattern regions, each having two sides parallel to a first direction and two sides parallel to a second direction. The plurality of pattern regions are located so that, for each of the plurality of pattern regions, the other pattern regions are present in regions of the mold aside from a first region sandwiched between two straight lines formed by extending the two sides parallel to the first direction in the first direction and a second region sandwiched between two straight lines formed by extending the two sides parallel to the second direction in the second direction. |
| 申请公布号 |
US2016016354(A1) |
申请公布日期 |
2016.01.21 |
| 申请号 |
US201514798659 |
申请日期 |
2015.07.14 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Sakamoto Eiji;Tanaka Yusuke |
| 分类号 |
B29C59/02 |
主分类号 |
B29C59/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A mold capable of simultaneously forming a plurality of patterns of an imprint material on a substrate, the mold including:
a plurality of pattern regions, each having two sides parallel to a first direction and two sides parallel to a second direction, wherein the plurality of pattern regions are located so that, for each of the plurality of pattern regions, the other pattern regions are present in regions of the mold aside from a first region sandwiched between two straight lines formed by extending the two sides parallel to the first direction in the first direction and a second region sandwiched between two straight lines formed by extending the two sides parallel to the second direction in the second direction. |
| 地址 |
Tokyo JP |
