| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a valve body which eliminates the need for substantially stopping a substrate processing system when the valve body is cleaned. <P>SOLUTION: A substrate processing system comprises: a process chamber 13 performing dry etching process to a substrate S; and a transfer chamber 11 transferring the substrate S. A valve body 22 which opens or shuts off a communication port 19a allowing the process chamber 13 and the transfer chamber 11 to communicate with each other comprises: a movable body 23; and a cover member 24 formed by an opposite member 40 which is formed so as to be removed from the body 23 and faces the process chamber 13 through the communication port 19a when the valve body 22 shuts off the communication port 19a. When the valve body 22 shuts off the communication port 19a and the valve body 22 is viewed from the process chamber 13 side through the communication port 19a, all of the opposite member 40 can be visually checked in the communication port 19a. <P>COPYRIGHT: (C)2013,JPO&INPIT |
