| 摘要 |
The exposure apparatus of the present invention has an original holding unit including a holding frame that holds an original M by attracting the outer peripheral portion thereof and a drive unit that is capable of moving the holding frame while changing an irradiation area of the light to be irradiated on a pattern. Here, the holding frame has a penetrating portion, which is capable of flowing gas which is present in a space defined by the original and the holding frame into and out from the space, provided at both front and back lateral sides of the holding frame in the direction of movement thereof, and the penetrating portion has a shape or a configuration such that the pressure loss in the flow of the gas in a first direction is less than the pressure loss in the flow of the gas in a second direction. |
