发明名称 |
WAFER CARRIER HAVING PROVISIONS FOR IMPROVING HEATING UNIFORMITY IN CHEMICAL VAPOR DEPOSITION SYSTEMS |
摘要 |
A wafer carrier and methods of making the same for use in a system for growing epitaxial layers on one or more wafers by chemical vapor deposition. The wafer carrier includes wafer retention pockets recessed in its body. A thermally-insulating spacer is situated at least partially in the at least one wafer retention pocket and arranged to maintain a spacing between the peripheral wall surface and the wafer, the spacer being constructed from a material having a thermal conductivity less than a thermal conductivity of the wafer carrier such that the spacer limits heat conduction from portions of the wafer carrier body to the wafer. The wafer carrier further includes a spacer retention feature that engages with the spacer and includes a surface oriented to prevent centrifugal movement of the spacer when subjected to rotation about the central axis. |
申请公布号 |
EP2973661(A1) |
申请公布日期 |
2016.01.20 |
申请号 |
EP20140762924 |
申请日期 |
2014.03.14 |
申请人 |
VEECO INSTRUMENTS INC. |
发明人 |
KRISHNAN, SANDEEP;QUINN, WILLIAM, E.;MONTGOMERY, JEFFREY, S.;MANGUM, JOSHUA;URBAN, LUKAS |
分类号 |
H01L21/205;B23P19/04;C23C16/458;C30B25/12;H01L21/687 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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