SENSOR CALIBRATION METHOD, EXPOSURE METHOD, EXPOSURE DEVICE, DEVICE FABRICATION METHOD, AND REFLECTION TYPE MASK

摘要

There is provided an exposure device capable of accurately controlling an exposure amount on a photosensitive substrate when exposing a pattern of a reflection type mask onto the photosensitive substrate via a projection-optical system. The exposure device includes a first sensor (4) for detecting light coming from illumination system (1, 2) to the reflection type mask (M) and a second sensor (5) for detecting light coming from the illumination system to a reference reflection plane formed on the reflection type mask and reflected by the reference reflection plane to reach an image plane of a projection-optical system (PO). According to the detection result of the first sensor and the detection result of the second sensor, the first sensor is calibrated and the exposure amount applied to the photosensitive substrate (W) is controlled according to the detection result of the calibrated first sensor.