发明名称 |
Laser processing apparatus and exposure method |
摘要 |
<p>An exposure apparatus includes a stage (10) for holding a substrate (8) to be exposed; a direct writing mask (6) arranged above the substrate (8) to be exposed held by the stage (10); a repeated opening pattern in which a plurality of openings (6c) each having approximately the same size are arranged in a line at approximately the same interval, provided to the mask; an irradiation mechanism for irradiating with a linear laser beam (1c) along the repeated opening pattern; and a movement mechanism for moving a relative position of a laser beam which is formed in such a way that the linear laser beam formed by the laser processing mechanism passes through the plurality of openings of the opening pattern and the substrate held by the stage.</p> |
申请公布号 |
EP1770443(B1) |
申请公布日期 |
2016.01.20 |
申请号 |
EP20060019166 |
申请日期 |
2006.09.13 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
NAKAMURA, OSAMU;YAMAMOTO, HIROKO |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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