PLASMA PROCESSING APPARATUS AND UPPER ELECTRODE ASSEMBLY

摘要

The present invention aims to minutely adjust a lifting force of an upper electrode. A plasma processing device comprises supporting members, connecting members and a sliding member. Some of the supporting members are arranged in a cooling plate and configured to support an upper electrode in a direction of gravity. Some of the connecting members are arranged in the cooling plate and extend in a diametrical direction of the cooling plate to be engaged with the supporting members. The sliding member is configured to slide the connecting members inward in the diametrical direction of the cooling plate, thereby pushing the supporting members upwardly and lifting the upper electrode to the cooling plate.