| 摘要 |
A charged particle multi-beam processing device used to match different reference recording tools is configured to compensate a difference in an image of a target from a pattern forming apparatus from a predetermined threshold value according to at least one direction of the image area on a target or to expose a predetermined pattern to the target. The predetermined pattern (16) is provided as a graphic expression suitable for a reference tool such as raster graphics (161) on an image area on the target. A convolution kernel (162) is used to describe the mapping of the elements of the graphic expression to a pixel group on the center of the nominal location of the elements. The nominal exposure pattern is calculated by the graphic expression convolution of the convolution kernel in order to generate the nominal dose distribution over the target when the nominal exposure pattern is exposed to the processing apparatus. |
