| 摘要 |
The invention proposes an apparatus for gas cleaning having a high gas cleaning efficiency at any relative humidity. The apparatus comprises a passage (10) for gas flow; a hydrophilic carrier (12) permeable for gas flow, at least part of which is positioned within said passage for gas flow, and configured for containing a reagent that contacts the gas in said passage for gas flow; a unit (14) for disposing liquid to said carrier; and a controller (16), associated with said unit for disposing liquid, configured for controlling the unit for disposing to dispose an aqueous solution of dissolved reagent to the carrier; and after that controlling the unit for disposing to dispose liquid in case the humidity of the gas is below a first humidity threshold, or to stop disposing liquid in case the humidity of the gas is above a second humidity threshold. |
