| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an iris device to be used for an electron microscope, in which a shape of an iris hole is stabilized and the dimensional accuracy of an iris is held. <P>SOLUTION: The iris device to be used for an electron microscope has a structure obtained by laminating a silicon oxide film and an independent thin film on a silicon substrate successively from the silicon substrate side, and the independent thin film has a Young's modulus larger than that of the silicon oxide film and tensile stress. The iris device to be used for an electron microscope is composed of an SOI substrate obtained by laminating a silicon oxide film and a silicon film on the silicon substrate successively from the silicon substrate side, a part of the silicon substrate and the silicon oxide film are notched, the silicon film has an exposure surface on the silicon substrate side in an area not supported by the silicon oxide film, and the thickness of the silicon film not supported by the silicon substrate and the silicon oxide film is 0.2 μm or more and 50 μm or less. <P>COPYRIGHT: (C)2013,JPO&INPIT |
