| 摘要 |
A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D); which is characterized by including, as a cationic polymerization initiator (C), an aromatic sulfonium compound (C-1) represented by the following general formula (C-1):
(in the above general formula (C-1), R 1 , R 2 , and R 3 represents a monovalent organic group, Rf represents a fluoroalkyl group, m is the same number as the cationic charge of the "cation [S + (R 1 ) (R 2 ) (R 3 )]", n is an integer in the range of 0 to 6) as well as an aromatic thiol compound (E) represented by the following general formula (E):
(wherein, R 4 represents a mono- or di-valent aromatic hydrocarbon which may optionally have a substituent, p is an integer of 1 or 2.) |
