LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE AND POLYAMIDE AMIC ACID RESINS AND COATING SOLUTIONS THEREOF
摘要
Disclosed is a low toxicity aprotic alkyl amide solvent system used for the dissolution and application of polyamideimide and polyamide amic acid polymer resins. The solvent system can be used for the dissolution of polyamideimide and polyamide amic acid resins as an efficient method for incorporating these resins into functional coating compositions with the use of the solvent system.
申请公布号
EP2970714(A1)
申请公布日期
2016.01.20
申请号
EP20140770839
申请日期
2014.02.10
申请人
FUJIFILM HUNT CHEMICALS US, INC.
发明人
SIDENSTICK, JOHN;CLOUSTON, RUSSELL SCOTT;MULLINS, KATHRYN