| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad having high hardness and excellent dressing properties. <P>SOLUTION: In the polishing pad having a polishing layer consisting of foamed polyurethane including a hard segment and soft segment, the volume of the hard segment is increased, practically, the present ratio of the hard segment in the foamed polyurethane is set to 55% or more and 70% or less by pulse NMR measurement. This enables the polishing pad to develop hard, easy tensile break, and low elongation properties that maintain the high hardness and enhance the dressing properties of the polishing pad. <P>COPYRIGHT: (C)2011,JPO&INPIT |
