发明名称 INSULATING GATE TYPE BIPOLAR SEMICONDUCTOR DEVICE
摘要 <p>An insulated-gate bipolar semiconductor device is provided wherein electric resistance generated in an emitter impurity region and between an emitter electrode and a region in the close vicinity of a gate takes a prescribe value irrespective of the distance of the emitter impurity region in direct contact with the emitter electrode in order to increase a load short circuit safe operation region without degrading the forward voltage drop and switching characteristic. <IMAGE></p>
申请公布号 EP1050908(B1) 申请公布日期 2016.01.20
申请号 EP19980900704 申请日期 1998.01.22
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MINATO, TADAHARU
分类号 H01L29/739;H01L29/06;H01L29/08 主分类号 H01L29/739
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