发明名称 |
Dynamic support system for quartz process chamber |
摘要 |
One embodiment of the present invention provides a support system for providing dynamic support to a deposition reactor. The system includes a coupling mechanism configured to provide coupling between the deposition reactor and the support system, an attachment mechanism configured to attach the support system to an external frame, and at least one gas bellows situated between the coupling mechanism and the attachment mechanism. |
申请公布号 |
US9240513(B2) |
申请公布日期 |
2016.01.19 |
申请号 |
US201113079623 |
申请日期 |
2011.04.04 |
申请人 |
SolarCity Corporation |
发明人 |
Trujillo Robert T.;Beese Steven C.;Rozenzon Yan |
分类号 |
H01L31/18;F16F15/027;C23C16/44;C23C16/52;F16F15/023 |
主分类号 |
H01L31/18 |
代理机构 |
Park, Vaughan, Fleming & Dowler LLP |
代理人 |
Yao Shun;Park, Vaughan, Fleming & Dowler LLP |
主权项 |
1. A system for providing support to a deposition reactor to prevent thermal stress fracture, the system comprising:
a horizontally oriented platform positioned below and coupled to the deposition reactor, wherein a top portion of the deposition rector is attached to an external frame at an attachment point; an attachment mechanism positioned below the horizontally oriented platform and attached to the external frame; at least one gas bellows positioned between the platform and the attachment mechanism; and a pressure regulating mechanism coupled to the gas bellows and configured to automatically regulate gas pressure inside the gas bellows to move the platform to allow the attachment point of the top portion of the deposition reactor to remain at a same position while the deposition reactor expands or contracts due to temperature changes. |
地址 |
San Mateo CA US |