Imprint method and imprint apparatus

摘要

According to one embodiment, an imprint method is provided. In the imprint method, minute objects adhering to a shot of a substrate, on which imprinting is next performed, are removed after delivering the substrate to the interior of an imprint apparatus and before dropping a resist onto the substrate. Thereafter, a resist is dropped onto the shot. Further, a template that is an original plate having a concave-convex pattern is brought into contact with the resist to form a resist pattern on the substrate according to the concave-convex pattern.

主权项

1. An imprint method comprising:
delivering a substrate to an interior of an imprint apparatus, and placing the substrate on a sample stage; removing, before dropping a resist onto the substrate, minute objects adhering to a shot next-to-be-imprinted within the substrate that is placed on the sample stage; dropping the resist onto the shot; and bringing, into contact with the resist, a template that is an original plate having a concave-convex pattern to form a resist pattern on the substrate according to the concave-convex pattern.