发明名称 |
Mask having separated line patterns connected by a connecting pattern |
摘要 |
According to one embodiment, a mask includes a line-and-space mask pattern. The mask has a separation portion separating a line pattern in a predetermined region within the line-and-space mask pattern. The mask also includes a connection pattern arranged in a crossing direction crossing the extending direction of the line pattern connecting the separated line patterns. The connection pattern is arranged on a position where the end of the line pattern, which is separated by the separation portion, projects from the connection pattern. |
申请公布号 |
US9240321(B2) |
申请公布日期 |
2016.01.19 |
申请号 |
US201314096619 |
申请日期 |
2013.12.04 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
Iida Kazunori;Kobayashi Yuji |
分类号 |
G03F1/00;H01L21/033;H01L21/311;H01L23/532 |
主分类号 |
G03F1/00 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P |
主权项 |
1. A mask comprising:
a mask pattern in which line patterns and space patterns are alternately arranged in a crossing direction, the crossing direction being a direction that crosses an extending direction of the line patterns, the mask pattern forming a line-and-space pattern above an object to be processed; a separation portion that separates the line patterns in a predetermined region in the mask pattern; and a connection pattern arranged in the crossing direction, the connection pattern connecting the separated line patterns, wherein the connection pattern is arranged at a position in which ends of the line patterns that are separated by the separation portion project with respect to the connection pattern. |
地址 |
Minato-ku JP |