发明名称 Mask having separated line patterns connected by a connecting pattern
摘要 According to one embodiment, a mask includes a line-and-space mask pattern. The mask has a separation portion separating a line pattern in a predetermined region within the line-and-space mask pattern. The mask also includes a connection pattern arranged in a crossing direction crossing the extending direction of the line pattern connecting the separated line patterns. The connection pattern is arranged on a position where the end of the line pattern, which is separated by the separation portion, projects from the connection pattern.
申请公布号 US9240321(B2) 申请公布日期 2016.01.19
申请号 US201314096619 申请日期 2013.12.04
申请人 Kabushiki Kaisha Toshiba 发明人 Iida Kazunori;Kobayashi Yuji
分类号 G03F1/00;H01L21/033;H01L21/311;H01L23/532 主分类号 G03F1/00
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P
主权项 1. A mask comprising: a mask pattern in which line patterns and space patterns are alternately arranged in a crossing direction, the crossing direction being a direction that crosses an extending direction of the line patterns, the mask pattern forming a line-and-space pattern above an object to be processed; a separation portion that separates the line patterns in a predetermined region in the mask pattern; and a connection pattern arranged in the crossing direction, the connection pattern connecting the separated line patterns, wherein the connection pattern is arranged at a position in which ends of the line patterns that are separated by the separation portion project with respect to the connection pattern.
地址 Minato-ku JP