发明名称 |
THICK FILM PATTERN STRUCTURE AND METHOD FOR FABRICATING THE SAME |
摘要 |
The present invention relates to a thick film pattern structure, provided to reduce the taper angle in a pattern edge area after all layers are stacked by gradually reducing the pattern width and stacking the same material layers, when forming a thick film pattern obtained by repeating a stacking process, and to a method for forming the same. The thin film pattern structure comprises: a thick film pattern coating layer having any one pattern width; and other thick film pattern coating layers which are orderly stacked on the thick film pattern coating layer as the size of the pattern width is gradually reduced in an edge area of the thick film pattern coating layer. In addition, a thick film pattern made up of the thick film pattern coating layers has a step-shape. |
申请公布号 |
KR20160006529(A) |
申请公布日期 |
2016.01.19 |
申请号 |
KR20140086245 |
申请日期 |
2014.07.09 |
申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
KIM, YONG HWAN;YOON, EUK KUN;CHOI, YONG SEOK |
分类号 |
G06F3/041 |
主分类号 |
G06F3/041 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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