发明名称 Memory arrays and methods of forming an array of memory cells
摘要 A method of forming an array of memory cells includes forming lines of covering material that are elevationally over and along lines of spaced sense line contacts. Longitudinal orientation of the lines of covering material is used in forming lines comprising programmable material and outer electrode material that are between and along the lines of covering material. The covering material is removed over the spaced sense line contacts and the spaced sense line contacts are exposed. Access lines are formed. Sense lines are formed that are electrically coupled to the spaced sense line contacts. The sense lines are angled relative to the lines of spaced sense line contacts and relative to the access lines. Other embodiments, including structure independent of method, are disclosed.
申请公布号 US9240548(B2) 申请公布日期 2016.01.19
申请号 US201213485488 申请日期 2012.05.31
申请人 Micron Technology, Inc. 发明人 Sills Scott E.;Ramaswamy D. V. Nirmal
分类号 H01L45/00;H01L27/10;H01L27/105;H01L27/24 主分类号 H01L45/00
代理机构 Wells St. John, P.S. 代理人 Wells St. John, P.S.
主权项 1. A method of forming an array of memory cells, comprising: forming lines of covering material that are elevationally over and along lines of spaced sense line contacts; using longitudinal orientation of the lines of covering material in forming lines comprising programmable material and outer electrode material that are between and along the lines of covering material; removing the covering material over the spaced sense line contacts and exposing the spaced sense line contacts; forming access lines; and forming sense lines that are electrically coupled to the spaced sense line contacts, the sense lines angling longitudinally perpendicular relative to longitudinal orientation of the lines of spaced sense line contacts and relative to longitudinal orientation of the access lines.
地址 Boise ID US