发明名称 Humidity detection sensor and a method for manufacturing the same
摘要 A humidity detection sensor includes a lower electrode provided on a board, an upper electrode provided so as to face the lower electrode, a humidity sensing film which is formed at least between the lower electrode and the upper electrode and whose dielectric constant changes in response to humidity, and a protective film provided so as to cover the upper electrode. Each of the upper electrode and the protective film has an opening through which the humidity sensing film is partially exposed to the outside. In the opening, the humidity sensing film is provided so as to reach at least a position higher than the position of the lower surface of the protective film.
申请公布号 US9239308(B2) 申请公布日期 2016.01.19
申请号 US201313851795 申请日期 2013.03.27
申请人 ALPS ELECTRIC CO., LTD. 发明人 Tondokoro Atsushi;Waga Satoshi;Sato Takashi;Yokoyama Shinya;Morita Sumihito
分类号 G01R27/26;G01N27/22;G01N1/00;H01L21/00 主分类号 G01R27/26
代理机构 Beyer Law Group LLP 代理人 Beyer Law Group LLP
主权项 1. A humidity detection sensor comprising: a board; and a sensor section provided on the board, a capacitance of the sensor section changing in response to humidity, wherein the sensor section includes: a lower electrode provided on the board;an upper electrode provided so as to face the lower electrode, the upper electrode having at least one first opening;a humidity sensing film formed at least between the lower electrode and the upper electrode so as to fill a space between the upper electrode and the lower electrode such that the upper electrode and the lower electrode are in contact with the humidity sensing film, a dielectric constant of the humidity sensing film changing in response to the humidity; anda protective film provided so as to cover the upper electrode, the protective film having at least one second opening corresponding to the at least one first opening such that the humidity sensing film is exposed therethrough, and wherein the humidity sensing film is provided in the second opening such that an upper surface thereof in the second opening reaches a position higher than a lower surface of the protective film in the first opening.
地址 Tokyo JP