| 主权项 |
1. A wiring fault detection method comprising:
a voltage application step of applying a predetermined voltage to a wiring line formed on a semiconductor substrate; a measurement step of continuously measuring, for a certain time period, a temperature of a region of at least a part of the semiconductor substrate to which a voltage is applied in the voltage application step, by using an infrared camera; a judgment step of judging whether or not a temperature rise value, which is derived by subtracting a temperature value of the semiconductor substrate before the voltage is applied from a temperature value measured in the measurement step, is larger than or equal to a threshold; and a fault determination step of determining that the wiring line formed in the region has a short-circuit fault in a case where it is judged in the judgment step that the temperature rise value is larger than or equal to the threshold, and determining that the wiring line does not have a short-circuit fault in a case where it is judged that the temperature rise value is smaller than the threshold; wherein the threshold used in the judgment step is acquired by, using an average value and a standard deviation of a histogram of a background image created by integrating and averaging differences between adjacent frames of a moving image acquired by continuously imaging, for a certain time period, the semiconductor substrate before the voltage is applied by using the infrared camera, adding the average value to an integral multiple of the standard deviation. |
