发明名称 Memory component, memory device, and method of operating memory device
摘要 A memory component including first and second electrodes with a memory layer therebetween, the memory layer having first and second memory layers, the first memory layer containing aluminum and a chalcogen element of tellurium, the second memory layer between the first memory layer and the first electrode and containing an aluminum oxide and at least one of a transition metal oxide and a transition metal oxynitride having a lower resistance than the aluminum oxide.
申请公布号 US9240549(B2) 申请公布日期 2016.01.19
申请号 US201414201376 申请日期 2014.03.07
申请人 SONY CORPORATION 发明人 Ohba Kazuhiro;Yasuda Shuichiro;Mizuguchi Tetsuya;Aratani Katsuhisa;Shimuta Masayuki;Kouchiyama Akira;Ogasawara Mayumi
分类号 H01L45/00;G11C11/16;G11C13/00;H01L27/24 主分类号 H01L45/00
代理机构 Dentons US LLP 代理人 Dentons US LLP
主权项 1. A memory device comprising: a first electrode; a second electrode; and a memory layer between the first and second electrodes, wherein, the memory layer includes (a) a first memory layer containing aluminum (Al) and a chalcogen element, and (b) a second memory layer between the first memory layer and the first electrode and containing an aluminum oxide and at least one of a transition metal oxide and a transition metal oxynitride having a lower resistance than the aluminum oxide, andthe first memory layer has a resistance lower than the resistance value of the second memory layer.
地址 Tokyo JP