Methods, structures, and designs for self-aligning local interconnects used in integrated circuits

摘要

An integrated circuit includes a gate electrode level region that includes a plurality of linear-shaped conductive structures. Each of the plurality of linear-shaped conductive structures is defined to extend lengthwise in a first direction. Some of the plurality of linear-shaped conductive structures form one or more gate electrodes of corresponding transistor devices. A local interconnect conductive structure is formed between two of the plurality of linear-shaped conductive structures so as to extend in the first direction along the two of the plurality of linear-shaped conductive structures.

主权项

1. An integrated circuit, comprising:
at least four linear-shaped conductive structures formed to extend lengthwise in a first direction in a parallel manner to each other and each respectively including a gate electrode portion and an extending portion that extends away from the gate electrode portion, the gate electrode portions of the at least four linear-shaped conductive structures respectively forming gate electrodes of different transistors, the extending portions of the at least four linear-shaped conductive structures including at least two different extending portion lengths, wherein two of the at least four linear-shaped conductive structures respectively form two transistors of a first transistor type having a shared diffusion region of a first diffusion type, wherein two of the at least four linear-shaped conductive structures respectively form two transistors of a second transistor type having a shared diffusion region of a second diffusion type, wherein the shared diffusion region of the first diffusion type is electrically connected to the shared diffusion region of the second diffusion type; and a local interconnect conductive structure formed between at least two of the at least four linear-shaped conductive structures so as to extend in the first direction along the at least two of the at least four linear-shaped conductive structures.