发明名称 PRE-TREATMENT METHOD OF PLATING, PLATING SYSTEM, AND RECORDING MEDIUM
摘要 The present invention provides a pre-treatment method for plating, which prevents a catalyst layer from being peeled from a substrate. The pre-treatment method for plating which is to form a catalyst layer on a substrate comprises the following processes of: enabling a catalyst (22a) to be adsorbed onto a substrate (2) to form a catalyst layer (22); and forming a catalyst fixation layer (27) right on the catalyst layer (22).
申请公布号 KR20160006597(A) 申请公布日期 2016.01.19
申请号 KR20150092123 申请日期 2015.06.29
申请人 TOKYO ELECTRON LIMITED 发明人 INATOMI YUICHIRO;TANAKA TAKASHI
分类号 H01L21/768;H01L21/288 主分类号 H01L21/768
代理机构 代理人
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