发明名称 |
PRE-TREATMENT METHOD OF PLATING, PLATING SYSTEM, AND RECORDING MEDIUM |
摘要 |
The present invention provides a pre-treatment method for plating, which prevents a catalyst layer from being peeled from a substrate. The pre-treatment method for plating which is to form a catalyst layer on a substrate comprises the following processes of: enabling a catalyst (22a) to be adsorbed onto a substrate (2) to form a catalyst layer (22); and forming a catalyst fixation layer (27) right on the catalyst layer (22). |
申请公布号 |
KR20160006597(A) |
申请公布日期 |
2016.01.19 |
申请号 |
KR20150092123 |
申请日期 |
2015.06.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
INATOMI YUICHIRO;TANAKA TAKASHI |
分类号 |
H01L21/768;H01L21/288 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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