| 摘要 |
PROBLEM TO BE SOLVED: To provide ion implantation device and method that can be used in a broad range.SOLUTION: An ion implantation device has a lens electrode unit 802 having plural electrodes for collimating an ion beam, and a vacuum unit 804 in which the lens electrode unit 802 is housed under a vacuum environment. The vacuum unit 804 has a first vacuum container 806 having a first conductive container wall 814, a second vacuum container 808 having a second conductive container wall 816, and an insulating container wall 810 which makes the first vacuum container 806 and the second vacuum container 808 mutually intercommunicate with each other and insulates the first conductive container wall 814 from the second conductive container wall 816. An insulation member 828 for insulating at least one of the plural electrodes of the lens electrode unit 802 from at least one of the first conductive container wall 814 and the second conductive container wall 816 is provided. The insulation member 828 is mounted together with the lens electrode unit 802 under the vacuum environment. |
