发明名称 METHOD OF MANUFACTURING HIGH FREQUENCY CIRCUIT
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a high frequency circuit, in which variations in the electrical length of a line with reference to the fundamental and harmonic waves can be suppressed even if the dielectric constant of a dielectric is varied.SOLUTION: In a method of manufacturing a high frequency circuit, in which one mask for exposure is selected from a plurality of masks for exposure in accordance with the dielectric constant of a dielectric, a photosensitive resist layer is formed on the surface of the dielectric, the resist layer is exposed using the selected mask for exposure, an opening is formed in the resist layer by developing the exposed resist layer, and a line is formed on the surface of the dielectric exposed from the opening.
申请公布号 JP2016009748(A) 申请公布日期 2016.01.18
申请号 JP20140129119 申请日期 2014.06.24
申请人 TOSHIBA CORP 发明人 TAKAGI KAZUTAKA
分类号 H01L21/027;G03F1/68;G03F7/20;H01L21/822;H01L27/04;H03F1/02;H03F3/19;H03F3/21;H03F3/60;H05K3/00 主分类号 H01L21/027
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