| 摘要 |
PROBLEM TO BE SOLVED: To provide a photomask used for producing a display device substrate, the photomask having less influences of sublimate from a photosensitive resin composition, and also to provide a manufacturing method of a photomask and a manufacturing method of a display device substrate.SOLUTION: There is provided a photomask with a surface of a plurality of second openings having the refractive index of 1.4-1.8, so as to form structures having different heights from each other on a display device substrate at stable characteristics (height and size) regardless of a production amount. Thereby, a manufacturing method of a display device substrate can be provided capable of stably producing structures having different heights such as a spacer, regardless of a production amount. |
