| 摘要 |
PROBLEM TO BE SOLVED: To provide a shower plate which constitutes a gas supply electrode used in plasma CVD, capable of suppressing foreign objects from getting mixed with a film-deposited substrate and a film to be deposited, and performing stable plasma film deposition while suppressing unnecessary discharge, and to provide a manufacturing method of the shower plate.SOLUTION: The problem is solved by a shower plate which includes: a thermal spray film which covers a surface of the shower plate opposing to a film-deposited substrate; gas supply holes which are formed from the surface of the thermal spray film opposing to the film-deposited substrate through a shower plate body; and a coating film which is formed on the surface of the thermal spray film opposing to the film-deposited substrate and also from the surface of the thermal spray film opposing to the film-deposited substrate to positions of the gas supply holes beyond a borderline of the thermal spray film and the shower plate body, and which is formed of conductive non-oxide material. |
