MANUFACTURING METHOD OF PHOTOCATALYST LAMINATE, SPUTTERING TARGET, AND MANUFACTURING METHOD OF THE SPUTTERING TARGET

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of forming a photocatalyst laminate showing an excellent photocatalyst function on a substrate, a sputtering target, and a manufacturing method of the sputtering target.SOLUTION: A photocatalyst laminate 10 showing a photocatalyst function includes a first component showing the photocatalyst function and a second component having a melting point lower than a temperature between the melting point of the first component and a temperature at which the photocatalyst function of the first component starts lower. The photocatalyst laminate can be produced using a sputtering target with a mixture ratio of the first component and the second component of 95:5 to 20:80 in weight percent. The first component is of a fine particle consisting of anatase type titanium oxide with an average particle size of 10 to 200 nm.