| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for estimating the positional accuracy of a transfer pattern transferred and formed by imprint processing using an imprint mold, and a method for assuring the positional accuracy of the transfer pattern.SOLUTION: A transfer pattern is formed using an imprint mold which includes a base having a first surface 2a and a second surface 2b facing the first surface 2a, has a fine projecting and recessing pattern formed on the first surface side, and has a concavity 4 formed at approximately the center on the second surface 2b side as plan view. In the transfer pattern, a projecting and recessing volume of a projecting and recessing portion that is present within a region around the concavity 4 is calculated on the basis of a surface shape of the second surface 2b, information on the deformation of a fine projecting and recessing pattern 5 of the imprint mold is obtained from the projecting and recessing volume, and positional accuracy of the transfer pattern is estimated from positional information of the fine projecting and recessing pattern 5 of the imprint mold during the imprint processing, the positional information being obtained on the basis of information on the deformation and positional information of the fine projecting and recessing pattern 5. |
