| 摘要 |
PROBLEM TO BE SOLVED: To provide a base material for an imprint mold capable of preventing a magnification ratio of a fine projecting and recessing pattern from exceeding a desired range, and an imprint mold obtained by using the base material for an imprint mold.SOLUTION: A base material 1 for an imprint mold includes a base 2 having a first surface 2a and a second surface 2b facing the first surface 2a. A concavity 4 is formed at approximately the center on the second surface 2b side as plan view, and a recessed portion having a projecting and recessing volume of a reference volume or more is not present within a region around the concavity 4 on the second surface 2b side. |
