| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography apparatus that is advantageous in the point of a required power supply capacity.SOLUTION: A lithography apparatus includes a plurality of patterning sections (drawing processing sections 25), a shared power supply 28 for supplying power to at least some of a plurality of units, requiring power, in the plurality of patterning sections, and a cluster controller 26 for controlling the plurality of patterning sections. The cluster controller 26 controls the operation period of the plurality of patterning sections, respectively, so that the summation of power required by at least some units, for the plurality of patterning sections, does not exceed the capacity of the shared power supply 28. |
