| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for processing a work piece which enables the suppression of residue production owing to the removal of static charge from an electrostatic chuck of a plasma processing device.SOLUTION: A method for processing a work piece comprises: the step ST1 of attaching the work piece to an electrostatic chuck of a plasma processing device in an electrostatic manner, provided that the work piece has, on a substrate, an organic polymer layer and a resist mask; the step ST2 of etching the organic polymer layer by plasma of first gas through the resist mask; the step ST3 of detaching the work piece from the electrostatic chuck while producing plasma of second gas; and the step ST4 of delaminating the resist mask. The second gas is an oxygen gas or a mixed gas of an oxygen gas and an inert gas smaller than argon gas in atomic weight. |
